GaAs Molecular Beam Epitaxy on (110)-Oriented Substrates
نویسندگان
چکیده
Molecular-beam epitaxial growth of Si-doped GaAs single-crystal layers on (110)-oriented substrates has been studied. The surface morphology grown films was analyzed by scanning electron microscopy and atomic force microscopy, the crystal structure estimated X-ray grazing incidence diffraction, in-plane pole figures, reciprocal space mapping, photoluminescence spectroscopy. type, concentration, mobility charge carriers in were measured four-probe method van der Pauw geometry at temperatures 300 77 K. possible existence two areas conditions, where increased concentration electrons are achieved, shown: first, main area with highest values is Tg = 450–500 °C V/III ratio γ 20–40, second, minor one 600–680 40–70. hole conductivity obtained a temperature 580 low value 16. It also shown that defect-free high not necessarily accompanied smooth surface.
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ژورنال
عنوان ژورنال: Crystals
سال: 2022
ISSN: ['2073-4352']
DOI: https://doi.org/10.3390/cryst13010028